Aiming at the problems of low plating efficiency and uneven coating in the current fixed electrode barrel plating method, a method of barrel plating on diamond surface based on rotating electrode was proposed, while the corresponding barrel plating device was developed. The mechanism of diamond rotary electrode barrel plating was analyzed, and the effects of plating parameters on deposition rate and morphology of diamond coating were studied by experiments. The results show that the rotating electrode can drive the abrasive stack to increase its overturning frequency and dispersing ability, and improve the contact uniformity between the abrasive stack with the electrode and plating solution, so as to improve the uniformity and surface quality of the coating. The results show that the best process parameters of rotating electrode barrel plating method are as follows: barrel plating current 4 A, cathode rotating speed 20 r/min, cathode rotor diameter 22.5 mm, grain size code of diamond 70/80. In addition, with the increase of rolling frequency of abrasive pile, the contact uniformity between abrasive particles is improved, which allows the increase of barrel plating space and electrode size, thus increasing the loading capacity of single plating. The results show that the maximum loading capacity of rotating electrode barrel plating method in 2 L capacity plating bottle can reach 700 g, which is about twice of the fixed electrode loading capacity under the same conditions, and the production efficiency is significantly improved.