Investigating the photoluminescence spectroscopy (PL) of CVD diamond with 10 ppm N
2 added in the reaction gas, it demonstrates that [NV]
0 and [NV]
- related to N impurity and [SiV] related to Si impurity are the main defects in diamond. After high temperature and high pressure (HPHT) treatment, the [NV]
0 peak intensity was weakened, the [NV]
- peak intensity was enhanced, the [SiV] peak intensity was significantly enhanced, and [SiV]
- broad peak appears when the N
2 content was decreased to 1 ppm and 0.5% O
2 was added in the reaction gas, the [NV]
0 and [NV]
- peaks disappeared. When the O
2 was increased to 1%, the [SiV] peak intensity significantly decreased. As the O
2 content continued to increase, the decreasing of [SiV] peak intensity slowed down. These results demonstrated that a small amount of O
2 addition was helpful to the inhibition and elimination of N and Si impurities in CVD diamond.