Design and function of cold trap in the process of preparing diamond films by DC arc plasma jet chemical vapor deposition

CHEN Liangxian; SHAO Siwu; LIU Peng; AN Kang; ZHENG Yuting; HUANG Yabo; BAI Mingjie; ZHANG Jianjun; LIU Jinlong; WEI Junjun; LI Chengming

doi:10.13394/j.cnki.jgszz.2021.0113

Volume 42 Issue 2

May 2022

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Article Navigation > Diamond & Abrasives Engineering > 2022 > 42(2): 150-155

CHEN Liangxian, SHAO Siwu, LIU Peng, AN Kang, ZHENG Yuting, HUANG Yabo, BAI Mingjie, ZHANG Jianjun, LIU Jinlong, WEI Junjun, LI Chengming. Design and function of cold trap in the process of preparing diamond films by DC arc plasma jet chemical vapor deposition[J]. Diamond & Abrasives Engineering, 2022, 42(2): 150-155. doi: 10.13394/j.cnki.jgszz.2021.0113

Citation:

CHEN Liangxian, SHAO Siwu, LIU Peng, AN Kang, ZHENG Yuting, HUANG Yabo, BAI Mingjie, ZHANG Jianjun, LIU Jinlong, WEI Junjun, LI Chengming. Design and function of cold trap in the process of preparing diamond films by DC arc plasma jet chemical vapor deposition[J]. Diamond & Abrasives Engineering, 2022, 42(2): 150-155. doi: 10.13394/j.cnki.jgszz.2021.0113

Citation:

CHEN Liangxian, SHAO Siwu, LIU Peng, AN Kang, ZHENG Yuting, HUANG Yabo, BAI Mingjie, ZHANG Jianjun, LIU Jinlong, WEI Junjun, LI Chengming. Design and function of cold trap in the process of preparing diamond films by DC arc plasma jet chemical vapor deposition[J]. Diamond & Abrasives Engineering, 2022, 42(2): 150-155. doi: 10.13394/j.cnki.jgszz.2021.0113

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Design and function of cold trap in the process of preparing diamond films by DC arc plasma jet chemical vapor deposition

doi: 10.13394/j.cnki.jgszz.2021.0113

1.
Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China
2.
Shunde Graduate School, University of Science and Technology Beijing, Foshan 528399, Guangdong, China

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Received Date: 2021-11-20
Accepted Date: 2021-12-29
Rev Recd Date: 2021-12-20

Abstract

Abstract

Firstly, this experiment introduces the principle of the DC arc jet method, the design of the gas circulation system and its advantages and disadvantages. Secondly, the design of the cold trap system and its working principle are introduced in detail. Finally, Raman spectroscopy and Fourier transform infrared spectroscopy are used to compare the quality of the diamond films prepared before and after adding the cold trap system. The results show that the cold trap system can effectively filter the oil vapor in the circulating gas lines and avoid the incorporation of impurities in diamond films. After adding the cold trap system, the impurity in the diamond wafer is reduced, and the half width of the diamond Raman peak is reduced to 6.76 cm⁻¹, which is closed to Ib type single crystal diamond. In addition, the crystal quality and the optical transmittance of the free-standing diamond wafer is significantly improved, and the transmittance at the wavelength of 10.6 μm reaches 68.4%.
- DC arc plasma jet chemical vapor deposition （DCPJCVD）,
- diamond films,
- circulation system,
- cold trap

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References(31)

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