CN 41-1243/TG ISSN 1006-852X
Volume 40 Issue 5
Oct.  2020
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WU Xiaolei, XU Shuai, ZHAO Yanjun, WU Xiao, CHANG Haofeng, GUO Xingxing. Suppression and elimination of [NV] and [SiV] defects in CVD single crystal diamond[J]. Diamond & Abrasives Engineering, 2020, 40(5): 42-44. doi: 10.13394/j.cnki.jgszz.2020.5.0007
Citation: WU Xiaolei, XU Shuai, ZHAO Yanjun, WU Xiao, CHANG Haofeng, GUO Xingxing. Suppression and elimination of [NV] and [SiV] defects in CVD single crystal diamond[J]. Diamond & Abrasives Engineering, 2020, 40(5): 42-44. doi: 10.13394/j.cnki.jgszz.2020.5.0007

Suppression and elimination of [NV] and [SiV] defects in CVD single crystal diamond

doi: 10.13394/j.cnki.jgszz.2020.5.0007
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  • Rev Recd Date: 2020-10-10
  • Available Online: 2022-04-06
  • Investigating the photoluminescence spectroscopy (PL) of CVD diamond with 10 ppm N2 added in the reaction gas, it demonstrates that [NV]0 and [NV]- related to N impurity and [SiV] related to Si impurity are the main defects in diamond. After high temperature and high pressure (HPHT) treatment, the [NV]0 peak intensity was weakened, the [NV]- peak intensity was enhanced, the [SiV] peak intensity was significantly enhanced, and [SiV]- broad peak appears when the N2 content was decreased to 1 ppm and 0.5% O2 was added in the reaction gas, the [NV]0 and [NV]- peaks disappeared. When the O2 was increased to 1%, the [SiV] peak intensity significantly decreased. As the O2 content continued to increase, the decreasing of [SiV] peak intensity slowed down. These results demonstrated that a small amount of O2 addition was helpful to the inhibition and elimination of N and Si impurities in CVD diamond.

     

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