Citation: | LIU Zhenhui, CHEN Shaokun, PENG Yanan, LI Jiejing, SU Jianxiu. Compositions of slurry used in chemical-mechanically polishing 304 stainless steel[J]. Diamond & Abrasives Engineering, 2018, 38(2): 78-81,88. doi: 10.13394/j.cnki.jgszz.2018.2.0016 |
304 stainless steel will become one of the main materials of flexible display substrate due to its excellent characteristics. In order to improve the rate and quality of chemical mechanical polishing of 304 stainless steel, the influences of different oxidants on material removal rate and surface roughness under different mass concentration or volume concentration and pH value are mainly studied. The results show that the oxidants of Fe2O3, H2O2, and FeCl3 achieved the best polishing effects in pH=2, and that KMnO4 achieved the best polishing effect in pH=10. The best surface roughness is 4 nm when the volume concentration of H2O2 is 10 mL/L, and the highest material removal rate is 209 nm/min when the mass concentration of FeCl3 is 4.0 g/L at their optimum pH.