天线反射面表面富树脂层的精密抛光参数对表面粗糙度的影响规律

刘建奇; 康仁科; 田俊超; 董志刚; 鲍岩

doi:10.13394/j.cnki.jgszz.2022.0044

天线反射面表面富树脂层的精密抛光参数对表面粗糙度的影响规律

doi: 10.13394/j.cnki.jgszz.2022.0044

大连理工大学, 精密与特种加工教育部重点实验室, 辽宁大连 116024

基金项目: 上海航天科技创新基金（SAST2020-107）

详细信息

通讯作者:
鲍岩，男，1987年生，博士、副教授。主要研究方向：难加工材料的精密超精密加工。E-mail：baoy@dlut.edu.cn

中图分类号: TG58；TH16；TQ323.5
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出版历程
- 收稿日期: 2022-04-11
- 修回日期: 2022-05-26
- 录用日期: 2022-06-27
- 网络出版日期: 2022-06-27
- 刊出日期: 2023-04-20

The influence of precision polishing parameters on surface roughness of resin-rich layer on antenna reflective surface

Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024, Liaoning, China

摘要

摘要: 针对新一代全碳纤维复合材料天线对反射面表面富树脂层的高质量加工需求，开展富树脂层抛光工艺试验，研究抛光时间、磨粒粒径、磨粒质量分数、加载压力以及抛光转速对富树脂层表面粗糙度的影响规律。结果表明：在当前试验条件下，表面粗糙度随抛光时间的延长先减小后趋于稳定，随着磨粒粒径或加载压力的增大而增大，随磨粒质量分数的升高或抛光转速的增大先减小后增大。在此基础上形成优化工艺参数组合是磨粒粒径为25 nm，磨粒质量分数为20%，加载压力为14.1 kPa，抛光转速为50 r/min，抛光时间为1.0 h，抛光液流量为10 mL/min，用该参数组合加工可获得表面粗糙度S_a为4.73 nm的高质量富树脂层抛光表面。
- 环氧树脂 /
- 抛光 /
- 表面粗糙度 /
- 工艺参数
Abstract: The new generation antenna has high-quality processing requirements on the resin-rich layer of the reflecting surface. A polishing experiment on the resin-rich layer was carried out to study the parameters affecting the surface roughness of the layer, namely polishing time, abrasive particle size, abrasive particle mass fraction, loading pressure and polishing speed. The results show that under the current conditions, the surface roughness first decreases and then tends to be stable with the increase of polishing time. It increases with the increase of the abrasive particle size or the loading pressure, and first decreases and then increases with the increase of the abrasive particle mass fraction or the polishing speed. On this basis, an optimized process parameter combination is formed, which includes an abrasive size of 25 nm, an abrasive particle mass fraction of 20%, a loading pressure of 14.1 kPa, a polishing speed of 50 r/min, a polishing time of 1.0 hours, and a slurry flow rate of 10 mL/min. A high-quality resin rich layer polished surface with a surface roughness S_aof 4.73 nm can be obtained by machining with this parameter combination.
- epoxy resin /
- polishing /
- surface roughness /
- process parameters

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图 1 抛光原理图

Figure 1. Polishing schematic

下载: 全尺寸图片幻灯片

图 2 富树脂层抛光试验平台

Figure 2. Resin-rich layer polishing test platform

下载: 全尺寸图片幻灯片

图 3 抛光时间对表面粗糙度的影响规律

Figure 3. Effect of polishing time on surface roughness

下载: 全尺寸图片幻灯片

图 4 富树脂层随抛光时间变化的表面形貌

Figure 4. Surface topography of resin-rich layer as function of polishing time

下载: 全尺寸图片幻灯片

图 5 磨粒粒径对表面粗糙度的影响规律

Figure 5. Effect of abrasive particle size on surface roughness

下载: 全尺寸图片幻灯片

图 6 富树脂层随磨粒粒径变化的表面形貌

Figure 6. Surface topography of resin-rich layer as function of abrasive particle size

下载: 全尺寸图片幻灯片

图 7 磨粒质量分数对表面粗糙度的影响规律

Figure 7. Effect of abrasive particle mass fraction on surface roughness

下载: 全尺寸图片幻灯片

图 8 富树脂层随磨粒质量分数变化的表面形貌

Figure 8. Surface topography of resin-rich layer as function of abrasive particle mass fraction

下载: 全尺寸图片幻灯片

图 9 加载压力对表面粗糙度的影响规律

Figure 9. Effect of loading pressure on surface roughness

下载: 全尺寸图片幻灯片

图 10 富树脂层随加载压力变化的表面形貌

Figure 10. Surface topography of resin-rich layer as function of loading pressure

下载: 全尺寸图片幻灯片

图 11 抛光转速对表面粗糙度的影响规律

Figure 11. Effect of polishing speed on surface roughness

下载: 全尺寸图片幻灯片

图 12 富树脂层随抛光转速变化的表面形貌

Figure 12. Surface topography of resin-rich layer as function of polishing speed

下载: 全尺寸图片幻灯片

图 13 富树脂层加工后表面形貌

Figure 13. Surface topography of resin-rich layer

下载: 全尺寸图片幻灯片

表 1 富树脂层抛光试验工艺参数

Table 1. Process parameters of resin-rich layer polishing test

试验因素	数值
抛光磨粒粒径 d / nm	25, 50, 80, 100
磨粒质量分数 ω / %	5, 10, 20, 30
抛光液流量 l / (mL·min⁻¹)	10
加载压力 p / kPa	14.1, 17.8, 31.9, 47.1
抛光转速 n / (r·min⁻¹)	40, 50, 60, 70
抛光时间 t / h	0.5, 1.0, 1.5, 2.0, 2.5

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